Contact resistance in few and multilayer graphene devices

By A. Venugopal, Luigi Pietro Maria Colombo, E. Vogel. 2010

301 citations recorded by the source corpus.

Subfields: Atomic and Molecular Physics, and Optics, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/d60ee413f7a0eb0c6a3516024aa03ef6e507dc58

Citations in the corpus

• The role of contact resistance in graphene field-effect devices (2017, unknown): “Evaporator Exfoliated CBK 500 [110] Ni (60) E-Beam Exfoliated TLM 2500 [132] Ni (75) Evaporator CVD TLM 2200 [120] Ni/Au (100/10) E-Beam Exfoliated TLM 300 [113] Ni/Au (25/50) Evaporator CVD TLM 400 [120] Ni/Au (30/20) E-Beam CVD 2p/4p 2100 [133] Ni/Au(70/50) Sputtering Exfoliated TLM 7000 [134] Ni/”