Target material pathways model for high power pulsed magnetron sputtering

By D. Christie. 2005

283 citations recorded by the source corpus.

Subfields: Aerospace Engineering, Materials Chemistry, Mechanics of Materials

View Paper: https://www.semanticscholar.org/paper/d18be13d8df08a1409cce9295ad403ceec69033a

How researchers see this paper

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In Aerospace Engineering

1. K. Sarakinos
2. D. Lundin

In Materials Chemistry

1. D. Lundin
2. K. Sarakinos

In Mechanics of Materials

1. D. Lundin
2. K. Sarakinos

Citations in the corpus

• An introduction to thin film processing using high-power impulse magnetron sputtering (2012, background): “As the pulse is prolonged, it is more likely that a fraction of the ionized sputtered material is attracted back to the target surface and will participate in the sputtering process (selfsputtering).(63) This means that less sputtered material will reach the substrate, and the deposition rate is red”