Conformality of Plasma-Assisted ALD: Physical Processes and Modeling

By Hcm Harm Knoops, E. Langereis, Van de Sanden, W. Kessels. 2010

161 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/cfa1e2625e9cdf0941bdf9891a2bb0d4e59cb9df