Influence of pulse duration on the plasma characteristics in high-power pulsed magnetron discharges
By S. Konstantinidis, J. Dauchot, M. Ganciu, A. Ricard, M. Hecq. 2006
154 citations recorded by the source corpus.
Subfields: Electrical and Electronic Engineering, Materials Chemistry, Mechanics of Materials
View Paper: https://www.semanticscholar.org/paper/c2a8d781f08134a2a6f7b2402a5abd1df350e45c
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In Electrical and Electronic Engineering
In Materials Chemistry
In Mechanics of Materials
Citations in the corpus
- An introduction to thin film processing using high-power impulse magnetron sputtering (2012, background): “In addition, Konstantinidis et al.65 found that the amount of ions reaching the substrate is increased by increasing the plasma conductivity, which was seen by creating a secondary plasma between the magnetron and the substrate using an external inductive coil.”