Micromachining of buried micro channels in silicon

By M. Boer, R. Tjerkstra, E. Berenschot, H. Jansen, G. Burger, H. Gardeniers, M. Elwenspoek, A. V. D. Berg. Journal of microelectromechanical systems, 2000

188 citations recorded by the source corpus.

Subfields: Biomedical Engineering, Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/b7d0c8b70de3e0b9a992636dc7121041a598b266

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Biomedical Engineering

1. Satish G. Kandlikar

In Electrical and Electronic Engineering

1. Satish G. Kandlikar
2. Akhilesh V. Bapat

Citations in the corpus

• Black silicon method X: a review on high speed and selective plasma etching of silicon with profile control: an in-depth comparison between Bosch and cryostat DRIE processes as a roadmap to next generation equipment (2009, unknown): “etching high raised structures [230–308] with pulsed-mode”
• Review of fabrication of nanochannels for single phase liquid flow (2006, background): “[17] consists of eight basic steps which are depicted in Figure 9.”