Black silicon method X: a review on high speed and selective plasma etching of silicon with profile control: an in-depth comparison between Bosch and cryostat DRIE processes as a roadmap to next…

By H. Jansen, M. D. de Boer, S. Unnikrishnan, M. Louwerse, M. Elwenspoek. 2009

301 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/40f647df75a26c199da711795615ac16718e2f54