A Review of Dry Etching of GaN and Related Materials
By S. Pearton, R. Shul, Fan Ren. 2000
185 citations recorded by the source corpus.
Subfields: Condensed Matter Physics, Electrical and Electronic Engineering, Materials Chemistry
View Paper: https://www.semanticscholar.org/paper/abebc197b6237053d1b0ab31c45e310703dbcb06
How researchers see this paper
The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.
- Guangnan Zhou
- Hongyu Yu
- Fanming Zeng
- Wenmao Li
- Hui Wang
- T. Duan
- J. An
- Lingli Jiang
Citations in the corpus
- A Comprehensive Review of Recent Progress on GaN High Electron Mobility Transistors: Devices, Fabrication and Reliability (2018, background): “The dry etching rate can reach to the level of micron per minute handily [55,56].”