Atomic layer deposition of metal and nitride thin films: Current research efforts and applications for semiconductor device processing

By Hyungjun Kim. 2003

517 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Mechanics of Materials

View Paper: https://www.semanticscholar.org/paper/94e72d705a35c2f2ea825956616f915242d1bd3e

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Electrical and Electronic Engineering

1. Marcus Bäumer
2. A. Hamza
3. J. Weissmuller
4. J. Biener
5. Arne Wittstock
6. T. Baumann

In Electronic, Optical and Magnetic Materials

1. Marcus Bäumer
2. A. Hamza
3. J. Weissmuller
4. J. Biener
5. Arne Wittstock
6. T. Baumann

In Mechanics of Materials

1. Marcus Bäumer
2. A. Hamza
3. J. Weissmuller
4. J. Biener
5. Arne Wittstock
6. T. Baumann

Citations in the corpus

• Surface Chemistry in Nanoscale Materials (2009, methodology): “Consequently, the technique offers excellent atomic level control of the deposited film thickness [102–104].”