Recent aspects concerning DC reactive magnetron sputtering of thin films: a review

By I. Safi. 2000

496 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry, Mechanics of Materials

View Paper: https://www.semanticscholar.org/paper/8a8990ec9bd1814bf9e3ac6bbe0309a72df88b90

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In Materials Chemistry

1. Pichet Limsuwan

Citations in the corpus

• Growth of silver nanoparticles by DC magnetron sputtering (2012, background): “Direct current (DC) magnetron sputtering has long been used to fabricate thin films, nanostructured coatings, and nanoparticles of various materials, including metallic oxide, nitride, and carbide films [16–22].”
• Reactive magnetron sputtering of thin films: present status and trends (2005, unknown): “The value of the critical frequency fcr can be estimated from the following formula [9,43].”