Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

By Hb Harald Profijt, Se Stephen Potts, Van de Sanden, W. Kessels. 2011

807 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/8779cc8fb97f011898aa7c97c58f2771a9ebbe33

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1. E. Santecchia
2. A. Hamouda
3. Erfan Zalnezhad
4. Farayi Musharavati
5. Marcello Cabibbo
6. S. Spigarelli

Citations in the corpus

• Wear resistance investigation of titanium nitride-based coatings (2015, background): “This is a more gentle technique owing to the lower degree of particle bombardment [149] and it is frequently used in the CVD process known as atomic layer deposition (ALD) [150].”