Fundamental understanding and modeling of reactive sputtering processes

By S. Berg, T. Nyberg. 2005

710 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Mechanics of Materials

View Paper: https://www.semanticscholar.org/paper/7c166b0b0e6cfde547303af7426db65674b34bea

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Electrical and Electronic Engineering

1. D. Lundin
2. K. Sarakinos

In Electronic, Optical and Magnetic Materials

1. K. Sarakinos
2. D. Lundin

In Mechanics of Materials

1. D. Lundin
2. K. Sarakinos

Citations in the corpus

• An introduction to thin film processing using high-power impulse magnetron sputtering (2012, methodology): “, compound films with sufficient incorporation of the reactive gas atoms.(80,81) At these conditions, deposition rates lower than those obtained from an elemental (e.”