High power pulsed magnetron sputtering: Fundamentals and applications
By J. Alami, S. Bolz, K. Sarakinos. 2009
138 citations recorded by the source corpus.
Subfields: Electrical and Electronic Engineering, Materials Chemistry, Mechanics of Materials
View Paper: https://www.semanticscholar.org/paper/79b6e8288e45e1f31d10fe5a76e9d326add8b948
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In Electrical and Electronic Engineering
In Materials Chemistry
In Mechanics of Materials
Citations in the corpus
- An introduction to thin film processing using high-power impulse magnetron sputtering (2012, methodology): “This concept has been, for instance, used to deposit homogeneous hard nitride coatings on cutting inserts.(98) Smaller features, such as holes of several tens or hundreds of nanometers can also be successfully filled(101) or homogeneously coated.”
- Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands (2018, methodology): “the properties of the growing films by their high fraction of ionized sputtered material during the process [70].”