Nanoscale patterning using self-assembled polymers for semiconductor applications

By Kathryn W. Guarini, C. Black, K. Milkove, R. Sandstrom. 2001

151 citations recorded by the source corpus.

Subfields: Biomedical Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/71f7eb7d7caf0824e5e4bec7b652ceaae2731368

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Biomedical Engineering

1. Joy Y. Cheng
2. Ho-Cheol Kim
3. Y. Zhang
4. Ricardo Ruiz
5. Kathryn W. Guarini
6. Matthew E. Colburn
7. Gregory Breyta

In Materials Chemistry

1. Ricardo Ruiz
2. Charles T. Black
3. Matthew E. Colburn
4. Joy Y. Cheng
5. Kathryn W. Guarini
6. Ho-Cheol Kim
7. Y. Zhang
8. Gregory Breyta

Citations in the corpus

• Bit-Patterned Magnetic Recording: Theory, Media Fabrication, and Recording Performance (2015, methodology): “A conventional Cr liftoff method [78] fails to provide clean liftoff for a BCP with L0 ≤ 27 nm mainly due to the low aspect ratio of the PS lines.”
• Polymer self assembly in semiconductor microelectronics (2006, methodology): “the shallow-trench array by adjusting the pore diameter [48], a dimension that can be tuned either via the initial polymer template [51, 52] or by using a post-etch widening process that controls trench diameter independently of pore separation [2, 53].”