High Carrier Mobility in Single-Crystal Plasma-Deposited Diamond
By J. Isberg, J. Hammersberg, E. Johansson, T. Wikström, Daniel J. Twitchen, A. Whitehead, S. Coe, G. Scarsbrook. Science, 2002
1,182 citations recorded by the source corpus.
Subfields: Computational Mechanics, Materials Chemistry
View Paper: https://www.semanticscholar.org/paper/6beb4cf28e0c5390000526daccb5ed232cfbba4a
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In Computational Mechanics
In Materials Chemistry
- Fedor Jelezko
- J. Wrachtrup
- Hitoshi Umezawa
- K. Johnston
- V. Jacques
- P. Neumann
- Daniel J. Twitchen
- G. Balasubramanian
Citations in the corpus
- Surface transfer doping of semiconductors (2009, background): “Despite its high electron and hole mobilities (le 4500 cm V 1 s , lh 3800 cm V 1 s 1 for intrinsic single crystal CVD diamond) [15], undoped diamond is considered a perfect electrical insulator.”
- Recent advances in diamond power semiconductor devices (2018, methodology): “Diamond has a high carrier mobility (4500 and 3800 cm(2)/Vs for electron and holes, respectively) [1], a high breakdown field (> 10 MV/cm) [2], a low dielectric constant (5.”
- Electrochemical technologies in wastewater treatment (2004, background): “A recent finding from Sweden shows that pure diamond can be a very good conductor of electrons [183].”
- Schottky-quantum dot photovoltaics for efficient infrared power conversion (2008, methodology): “87 The total charge extracted in the time-of-flight measurements was less than 10% of the capacitive charge (determined using a parallel-plate model) to ensure that the electric field was not distorted; in the high injection regime, analysis of the time-of-flight transient signals becomes significan”
- Ultralong spin coherence time in isotopically engineered diamond. (2009, methodology): “Homoepitaxial CVD diamond layers were deposited onto specially prepared 〈100〉 -oriented diamond substrate”