Current conduction mechanisms in atomic-layer-deposited HfO2/nitrided SiO2 stacked gate on 4H silicon carbide

By Kuan Yew Cheong, J. Moon, H. Kim, W. Bahng, N. Kim. 2008

135 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/6593c518272adf90fc16646639c978d4cd908530