Low Temperature ( < 100 ° C ) Deposition of Aluminum Oxide Thin Films by ALD with O3 as Oxidant

By S. Kim, S. Lee, C. S. Hwang, Yo-Sep Min, J. Y. Won, Jaehack Jeong. 2006

149 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/652fd167ebd38af6a065ba4fb3923793694556c9