Comparison between ZnO films grown by atomic layer deposition using H2O or O3 as oxidant

By S. Kim, C. S. Hwang, S. Park, S. Yun. 2005

159 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/64155c5df5ada5187df07bec5c1541a3623964ac