In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition

By E. Langereis, Sbs Stephan Heil, Hcm Harm Knoops, W. Keuning, Van de Sanden, W. E. Kessels. 2009

284 citations recorded by the source corpus.

Subfields: Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials

View Paper: https://www.semanticscholar.org/paper/51b12fc199a32f1dcb16bfa3859fad704ca563d1

Citations in the corpus

• Optical Properties and Plasmonic Performance of Titanium Nitride (2015, unknown): “Woolam D+2L [116] Used TiCl4, H2, and N2 precursors; x < 1”