Symposium

By J. Blass, HaRav Avraham. 1979

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1. Tseung-Yuen Tseng
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Citations in the corpus

• Progress in the developments of (Ba,Sr)TiO3 (BST) thin films for Gigabit era DRAMs (2000, methodology): “[163], Toshiba successfully developed a new in-situ multi-step (IMS) process technology to achieve both conformal step coverage and high dielectric constant of CVD-BST.”