Radiation Chemistry in Chemically Amplified Resists

By T. Kozawa, S. Tagawa. 2010

266 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Surfaces, Coatings and Films

View Paper: https://www.semanticscholar.org/paper/42a11249509ed732a4a70b5292f745be35be49d1

Citations in the corpus

• High-NA EUV lithography: current status and outlook for the future (2022, unknown): “26) Although the probability is very low, there can be situations where random walks go in one general direction, which can lead to defects.”