Chemical vapor deposition of thin graphite films of nanometer thickness
By A. Obraztsov, E. Obraztsova, A. Tyurnina, A. Zolotukhin. 2007
506 citations recorded by the source corpus.
Subfields: Materials Chemistry
View Paper: https://www.semanticscholar.org/paper/3c14cfd30c1e2dcccf6d870ec7b6024330fbe1b2
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In Materials Chemistry
- Andrea C. Ferrari
- Francesco Bonaccorso
- Tawfique Hasan
- John Robertson
- Kostas Kostarelos
- M. Prato
- A. Bianco
- A. Castellanos-Gómez
Citations in the corpus
- Synthesis of Graphene and Its Applications: A Review (2010, methodology): “60 The process used a precursor gas mixture of H 2 and CH 4 (92:8 ratio), a total gas pressure of 80 Torr and was activated by DC discharge.”
- The origin of wrinkles on transferred graphene (2011, background): “1(c)), which are believed to arise from the difference between the thermal expansion coefficients of graphene and Ni [15].”
- Production and processing of graphene and related materials (2020, background): “These correspond to pleated/folded SLG due to released stress caused by the differences in the thermal expansion coefficients between SLG and the substrate, during cooling after growth [1228, 1229], or to local accumulation of carbon material at defects between coalescing grains of different orienta”
- Synthesis and Fabrication of Graphene and Graphene Oxide: A Review (2019, methodology): “Formation of FLG was observed on the evaporation of carbon from a graphite rod in 1971 [82].”
- Flexible Electronics: The Next Ubiquitous Platform (2012, background): “Chemical vapor deposition [227]–[230], [235], [236] and liquid phase exfoliation [231]–[235] are the most appealing and can be integrated in a roll-to-roll processes.”