Inductively coupled Ar/CH₄/H₂plasmas for low-temperature deposition of ordered carbon nanostructures
By I. Denysenko, S. Xu, J. Long, P. Rutkevych, N. Azarenkov, Ken Ostrikov. 2004
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The study of inductively coupled Ar/CH 4/H 2 plasmas in the plasma enhanced chemical vapor deposition (PECVD) of self-assembled carbon nanostructures (CN) was presented. A spatially averaged (global) discharge model was developed to study the densities and fluxes of the radical neutrals and charged species, the effective electron temperature, and methane conversion factors under various conditions. It was found that the deposited cation fluxes in the PECVD of CNs generally exceed those of the radical neutrals. The agreement with the optical emission spectroscopy (OES) and quadrupole mass spectrometry (QMS) was also derived through numerical results.
Subfields: Materials Chemistry
View Paper: https://www.semanticscholar.org/paper/329f9f27d6452abce7e29f8932f92a8d99a575ca
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In Materials Chemistry
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- Colloquium: Reactive plasmas as a versatile nanofabrication tool (2005, background): “…surface fluxes of numerous charged and neutral plasma species in the process of assembly of various carbon nanostructures sHash and Meyyappan, 2003; Denysenko et al., 2004; Gordillo-Vazques and Albella, 2004d. Larger building units se.g., larger nanoclusters or nucleates exceeding 10 nmd can be…”