Colloquium: Reactive plasmas as a versatile nanofabrication tool

By Ken Ostrikov. 2005

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The underlying physics of the application of low-temperature, low-pressure reactive plasmas in various nanoassembly processes is described. From the viewpoint of the ``cause and effect'' approach, this Colloquium focuses on the benefits and challenges of using plasma-based systems in nanofabrication of nanostructured silicon films, low-dimensional semiconducting quantum structures, ordered carbon nanotip arrays, highly crystalline ${\mathrm{TiO}}_{2}$ coatings, and nanostructured hydroxyapatite bioceramics. Other examples and future prospects of plasma-aided nanofabrication are also discussed.

Subfields: Computational Mechanics, Materials Chemistry, Mechanics of Materials

View Paper: https://www.semanticscholar.org/paper/1d8eb3dc937ee9dce2cb8270f3e635a7c7582ac7