Conformal contact and pattern stability of stamps used for soft lithography

By A. Bietsch, B. Michel. 2000

225 citations recorded by the source corpus.

Subfields: Atomic and Molecular Physics, and Optics, Biomedical Engineering, Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/2e68545bc99806752060dce75c6daf1d5fd49799

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Atomic and Molecular Physics, and Optics

1. M. Textor
2. Gabor Csucs
3. D. Falconnet
4. H. Grandin

In Biomedical Engineering

1. Jurriaan Huskens
2. C. Acikgoz
3. M. Textor
4. Gabor Csucs
5. D. Falconnet
6. H. Grandin
7. G. Vancso
8. M. Hempenius

In Electrical and Electronic Engineering

1. Jurriaan Huskens
2. C. Acikgoz
3. G. Vancso
4. M. Hempenius
5. Lin Yao
6. Junhui He

Citations in the corpus

• Surface engineering approaches to micropattern surfaces for cell-based assays. (2006, background): “These two opposing requirements limit not only the resolution of the technique (smallest possible structure size) but also the possible geometries, the largest possible pitch being equal to the distance between two patches of a given shape [75,111].”
• Polymers in conventional and alternative lithography for the fabrication of nanostructures (2011, background): “In addition, these relief structures tend to deform upon release from the master because of surface tension [96–99].”