Deep reactive ion etching of Pyrex glass using SF6 plasma

By Xinghua Li, T. Abe, Masayoshi Esashi. 2001

219 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry, Mechanics of Materials

View Paper: https://www.semanticscholar.org/paper/2dfcb60b89d1324f68b0a0969e2efe30388fbcc4

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

1. A. Evans
2. Chao Chen
3. Minqiang Bu
4. J. Wilkinson
5. Chuanzong Li
6. Jiawen Li
7. Yiyuan Zhang
8. Dong Wu

Citations in the corpus

• A new masking technology for deep glass etching and its microfluidic application (2004, methodology): “[24] X.”
• Bioinspired micro/nanostructured surfaces prepared by femtosecond laser direct writing for multi-functional applications (2020, background): “Correlations among nature organisms (bats [57], lotus leaf [58], water strider [59], rose petal [60], pitcher plant [61], butterfly wings [62] and desert beetle [63]), fabrication methods (lithography [64], reactive ion etching [65], electrochemical deposition [66], plasma processing [67] and femtos”