Microbridge testing of silicon nitride thin films deposited on silicon wafers

By Tong-Yi Zhang, Y. Su, C.-F. Qian, M. Zhao, L.-Q Chen. 2000

138 citations recorded by the source corpus.

View Paper: https://www.semanticscholar.org/paper/2c20e1d04e6a7d4d8eee5b6693c128aabdc248ab

Citations in the corpus

• The mechanical properties of atomic layer deposited alumina for use in micro- and nano-electromechanical systems (2006, unknown): “ALD Al2O3 PR 100 177 427 ± 34 (T) TW ALD Al2O3 PR 50 177 474 ± 70 (T) TW LPCVD SixNy BT 500 PolyMUMPs 114–130 (T) [42] LPCVD SixNy PR 150–500 850 125–967 (T) [43] LPCVD SixNy BT 2000 800 98 (T) [44] LPCVD SixNy WC 4–20 780–840 1000 (T) [45] LPCVD SixNy BT 100–300 790 1000 (T) [46] LPCVD SixNy BT ∼29”