Electron beam lithography: resolution limits and applications

By C. Vieu, F. Carcenac, A. Pépin, Yong Chen, M. Mejías, A. Lebib, L. Manin-Ferlazzo, L. Couraud, H. Launois. 2000

1,040 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Structural Biology

View Paper: https://www.semanticscholar.org/paper/281006d2a2acff6b5b07405d42583c57b21a1695

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Electrical and Electronic Engineering

1. Zhong Lin Wang
2. Sheng Xu
3. Werayut Srituravanich
4. Nikolaj Gadegaard
5. Alongkorn Pimpin
6. Wenzhuo Wu
7. Chengkuo Lee
8. Long Liu

In Structural Biology

1. Werayut Srituravanich
2. Alongkorn Pimpin

Citations in the corpus

• Review on Micro- and Nanolithography Techniques and Their Applications (2012, background): “Electron beam lithography [22, 23] utilizes an accelerated electron beam focusing on an electron-sensitive resist [24, 25] to make an exposure.”
• One-dimensional ZnO nanostructures: Solution growth and functional properties (2011, background): “Electrons are accelerated by tens of kilovolts and have a wavelength on the order of Ångstroms, which gives a much higher resolution than conventional photolithography [274].”
• The control of human mesenchymal cell differentiation using nanoscale symmetry and disorder. (2007, methodology): “Recently, electron beam lithography (EBL) has been used to fabricate ultra-precise nanotopographies of ordered arrays down to 10 nm in size for the examination of cell–nanoenvironment interaction”