Use of SU-8 photoresist for very high aspect ratio x-ray lithography

By A. Bogdanov, S. Peredkov. 2000

146 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Mechanical Engineering, Surfaces, Coatings and Films

View Paper: https://www.semanticscholar.org/paper/2630ddce3daf7c488ee21f477fda20ed626d509e

Citations in the corpus

• SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography (2007, unknown): “In fact, SU-8 pillars with an 8 μm diameter and aspect ratio up to 100 have been reported [94].”