Atomic-layer deposition of wear-resistant coatings for microelectromechanical devices

By T. Mayer, Jeffrey W. Elam, S. George, P. Kotula, R. Goeke. 2003

193 citations recorded by the source corpus.

Subfields: Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/136756fd40a41a37349b556cfc843fea580fbf35

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Atomic and Molecular Physics, and Optics

1. Ken Gall

In Electrical and Electronic Engineering

1. S. George

In Materials Chemistry

1. S. George
2. Ken Gall
3. Christofer Hierold
4. Christoph Stampfer

Citations in the corpus

• The mechanical properties of atomic layer deposited alumina for use in micro- and nano-electromechanical systems (2006, background): “Recently ALD films have been applied to polysilicon microstructures as protective coatings [1], creep suppression coatings [2], coatings preventing diffusional-transport [3], wear resistant coatings [ 4 ], and hydrophobic coatings [5].”