Two-photon lithography of nanorods in SU-8 photoresist
By Saulius Juodkazis, Vygantas Mizeikis, K. Seet, M. Miwa, Hiroaki Misawa. 2005
307 citations recorded by the source corpus.
Subfields: Atomic and Molecular Physics, and Optics, Biomedical Engineering
View Paper: https://www.semanticscholar.org/paper/00cf5bfbf1090d2c7a6544d6b8d87ab13dbb5480
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In Biomedical Engineering
Citations in the corpus
- Two‐photon stereolithography for realizing ultraprecise three‐dimensional nano/microdevices (2009, background): “Three different regions within polymerization: (i) a fully polymerized region with high molecular weight (solid state), (ii) a weakly polymerized region with low molecular weight (solid-liquid state), and (iii) an unpolymerized region (liquid state) [47, 48].”
- Perspective on 3D printing of separation membranes and comparison to related unconventional fabrication techniques (2017, methodology): “Despite the ‘low’ resolution, AM is still able to precisely control the production of complex structures, however this is currently capped at a resolution of ~100 nm (TPP-based AM).”
- SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography (2007, unknown): “This seems to be the case for SU-8, as patterns with pillars, planes and cage microstructures [52, 137, 138] and 3D nanostructures with lateral sizes as small as 120 nm [139] have been obtained by this technique (figure 12).”