Directed block copolymer self-assembly for nanoelectronics fabrication

By Daniel J. C. Herr. 2011

189 citations recorded by the source corpus.

Subfields: Materials Chemistry, Organic Chemistry

View Paper: https://www.semanticscholar.org/paper/ff1b5e3c5444fa5b4a5ab0cdfcf9c06b16e461ff

How researchers see this paper

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In Materials Chemistry

1. Ronald Fedkiw
2. Stanley J. Osher
3. Frédéric Gibou

Citations in the corpus

• A review of level-set methods and some recent applications (2018, background): “One application of particular interest is in the context of Directed Self-Assembly (DSA), which is a patterning technique for next generation lithography [168, 169].”