Proximity effect in electron beam lithography

By Liming Ren, Baoqin Chen. Proceedings. 7th International Conference on Solid-State and Integrated Circuits Technology, 2004., 2004

203 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Surfaces, Coatings and Films

View Paper: https://www.semanticscholar.org/paper/fded672150f467f5b69114cf7eeea29f4f91a65e

Citations in the corpus

• Directed self-assembly of block copolymers for use in bit patterned media fabrication (2013, unknown): “The period of the bits created using this technique is limited by the proximity effect, which causes adjacent features to overlap due to the scattering of the electrons within the resist [33] and backscattering of electrons from the substrate.”