Atomic layer deposition of tungsten using sequential surface chemistry with a sacrificial stripping reaction

By J. Klaus, S.J Ferro, S. George. 2000

165 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/fd2a072a3d8f498cba77e879b2a46070a675ba2d