A comparative study of oxygen/organosilicon plasmas and thin SiOxCyHz films deposited in a helicon reactor

By K. Aumaille, C. Vallée, A. Granier, A. Goullet, F. Gaboriau, G. Turban. 2000

139 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials

View Paper: https://www.semanticscholar.org/paper/fc6c46eddfee01452f74d87a36e45bce0dc60cab