Block Copolymer Lithography: Merging “Bottom-Up” with “Top-Down” Processes
By C. Hawker, T. P. Russell. 2005
536 citations recorded by the source corpus.
Subfields: Biomedical Engineering, Materials Chemistry, Organic Chemistry
View Paper: https://www.semanticscholar.org/paper/81feb1920bbf68f23298f015910c15e14a2fc445
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In Biomedical Engineering
In Materials Chemistry
Citations in the corpus
- Recent progress in antireflection and self-cleaning technology – From surface engineering to functional surfaces (2014, background): “Based on their micro-phase separation, self-assembly, or self-organizing properties, the molecular level structure (chain conformation), secondary structure (aggregation structure), and tertiary structure (self-assembly or self-organization) could be modulated to achieve the polymer film nanostructu”