Nanoimprint lithography: challenges and prospects

By S. Zankovych, T. Hoffmann, J. Seekamp, J. Bruch, C. Torres. 2001

195 citations recorded by the source corpus.

Subfields: Atomic and Molecular Physics, and Optics, Biomedical Engineering, Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/fb5a904b2fd5d6f120d3fbbb079c87ca7ed34486

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Atomic and Molecular Physics, and Optics

1. Wei Dang Lu
2. Ye Zhou
3. Connie J. Chang-Hasnain
4. Dmitri B. Strukov
5. Konstantin K. Likharev
6. Charles M. Lieber
7. Peidong Yang

In Biomedical Engineering

1. Wei Dang Lu
2. Connie J. Chang-Hasnain
3. Dmitri B. Strukov
4. Konstantin K. Likharev
5. Charles M. Lieber
6. Peidong Yang
7. Wei Cai
8. K. Kang

In Electrical and Electronic Engineering

1. Wei Dang Lu
2. Ye Zhou
3. Charles M. Lieber
4. Connie J. Chang-Hasnain
5. Dmitri B. Strukov
6. Konstantin K. Likharev
7. Shimeng Yu
8. M. Di Ventra

Citations in the corpus

• CMOL: Devices, Circuits, and Architectures (2006, methodology): “Fortunately, there are several new patterning methods, notably nanoimprint [26] and interference lithography [27], which may provide very high resolution (in future, down to a few nanometers) than the standard photolithography.”
• High-Index-Contrast Grating (HCG) and Its Applications in Optoelectronic Devices (2009, background): “The large fabrication tolerance makes HCG-VCSEL well suited for low-cost and high-throughput manufacturing technology, such as nanoimprinting [34].”
• Nanoelectronics from the bottom up. (2007, methodology): “The crossbar architecture can in principle be scaled to a memory density level of terabits per square centimetre by reducing the nanowire or CNT average pitch to 10 nm, a feat possible with advanced nanofabrication technique”