Shot noise, LER, and quantum efficiency of EUV photoresists

By R. Brainard, P. Trefonas, J. Lammers, C. Cutler, Joseph F. Mackevich, Alexander Trefonas, S. Robertson. SPIE Advanced Lithography, 2004

158 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Surfaces, Coatings and Films

View Paper: https://www.semanticscholar.org/paper/fb1fa277f60ccf86692ee808e7667791712fe595