Surface morphology and crystallinity control in the atomic layer deposition (ALD) of hafnium and zirconium oxide thin films

By D. Hausmann, R. Gordon. 2003

267 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/f97c25221824ff841529a79db2bd6fd78cf8dadc