Sub-5 nm Domains in Ordered Poly(cyclohexylethylene)-block-poly(methyl methacrylate) Block Polymers for Lithography

By Justin G. Kennemur, L. Yao, F. Bates, Marc Hillmyer. 2014

203 citations recorded by the source corpus.

Subfields: Biomedical Engineering, Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/f73e15a465f9ef19592692ea8f24140305b5db56