Smooth and high-rate reactive ion etching of diamond
By Y. Ando, Y. Nishibayashi, K. Kobashi, T. Hirao, K. Oura. 2002
136 citations recorded by the source corpus.
Diamond surfaces with patterned Al masks were etched by a reactive ion etching (RIE) system under conditions that the RF power was 100-280 W, the CF 4 /O 2 ratio was 0-12.5% and the gas pressure 2-40 Pa. It was found that the roughness of the etched diamond surface decreased with an increase in the CF 4 /O 2 ratio, although this reduced the selective etching ratio of diamond against Al. The gas pressure also affected the surface roughness and the etching anisotropy. The etching rate of diamond considerably increased upon a small addition of CF 4 in O 2 . Based on these results, we were successful in an anisotropic etching of diamond at a very high rate (∼9.5 μm/h) with a smooth etched surface (R a < 0.4 nm), a high selective etching ratio of diamond vs. Al, and a high aspect ratio (the height/diameter was ∼8 for array structures and ∼25 for exceptional cases) by choosing appropriate etching conditions.
Subfields: Electrical and Electronic Engineering, Materials Chemistry, Mechanics of Materials
View Paper: https://www.semanticscholar.org/paper/f48d12b984cde21be9c614c06ec6ac4a9fff5459
How researchers see this paper
The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.
In Electrical and Electronic Engineering
In Materials Chemistry
Citations in the corpus
- Fabrication of diamond nanowires for quantum information processing applications (2009, background): “fabricated structures in poly- and sc-D based on reactive ion etching (RIE) include microlenses [18, 19], porous diamond [20], eld emitters [21], waveguides [9], atomic force microscopy (AFM) tips [22], disks [10], cones and cylinders [23], nanopillars [24], microcylinders [25] and resonator arrays ”
- Quantum nanophotonics in diamond [Invited] (2016, background): “The first demonstration of microcylinders with the high aspect ratio of 8 (25 for exceptional cases) did not yet consider photonic applications but demonstrated smooth and high-rate reactive ion etching of diamond [29].”