High performance hard magnetic NdFeB thick films for integration into micro-electro-mechanical systems

By N. Dempsey, A. Walther, F. May, D. Givord, K. Khlopkov, Oliver Gutfleisch. 2007

166 citations recorded by the source corpus.

5μm thick NdFeB films have been sputtered onto 100mm Si substrates using high rate sputtering (18μm∕h). Films were deposited at ⩽500°C and then annealed at 750°C for 10min. While films deposited at temperatures up to 450°C have equiaxed grains, the size of which decreases with increasing deposition temperature, the films deposited at 500°C have columnar grains. The out-of-plane remanent magnetization increases with deposition temperature, reaching a maximum value of 1.4T, while the coercivity remains constant at about 1.6T. The maximum energy product achieved (400kJ∕m3) is comparable to that of high-quality NdFeB sintered magnets.

Subfields: Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials

View Paper: https://www.semanticscholar.org/paper/eefc78ddb5b6d9b09bab07a95fcd62b29df7a554

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In Atomic and Molecular Physics, and Optics

1. Naigang Wang
2. David P. Arnold
3. D. P. Arnold

In Electronic, Optical and Magnetic Materials

1. Naigang Wang
2. David P. Arnold
3. D. P. Arnold

Citations in the corpus

• Review of Microscale Magnetic Power Generation (2007, background): “high energy density micromagnets (such as CoPt [72]–[74], FePt [75], [76], SmCo [77], [78], or NdFeB [79]–[82]) are ongoing, but in general, the materials currently produced by microfabrication methods (sputtering/electroplating) do not”
• Permanent Magnets for MEMS (2009, methodology): “[ 42 ] developed a dc triode sputtering technique to produce 5-μm-thick Nd–Fe–B thick films at deposition rates up to 5 nm/s.”