Improving stamps for 10 nm level wafer scale nanoimprint lithography
By M. Beck, Mariusz Graczyk, I. Maximov, Eva-Lena Sarwe, T. Ling, M. Keil, L. Montelius. 2002
273 citations recorded by the source corpus.
Subfields: Biomedical Engineering, Electrical and Electronic Engineering
View Paper: https://www.semanticscholar.org/paper/ed7a6e96443d61f3a1a45edc966442978e8bce67
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In Biomedical Engineering
In Electrical and Electronic Engineering
Citations in the corpus
- Controlled co-evaporation of silanes for nanoimprint stamps (2005, background): “The silane coating can be performed by immersion in a solution of isooctane [5], or by chemical vapour deposition (CVD), either at ambient pressure by heating the silane on a hot plate [6, 7] or by applying a moderate vacuum of some millibars [2, 8].”