Light in tiny holes
By C. Genet, T. Ebbesen. Nature, 2007
1,987 citations recorded by the source corpus.
Subfields: Biomedical Engineering, Electronic, Optical and Magnetic Materials, Surfaces, Coatings and Films
View Paper: https://www.semanticscholar.org/paper/ed1bbc41211560de54b13bc8f3b72be507b4600e
How researchers see this paper
The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.
In Biomedical Engineering
- F. García de Abajo
- L. Kuipers
- T. Ebbesen
- F. J. García de Abajo
- F. García-Vidal
- Luis Martin-Moreno
- Franco Nori
- Sergey I. Bozhevolnyi
In Electronic, Optical and Magnetic Materials
- F. García de Abajo
- T. Ebbesen
- F. J. García de Abajo
- L. Kuipers
- F. García-Vidal
- Luis Martin-Moreno
- Darrick E. Chang
- Claes-Goran Granqvist
In Surfaces, Coatings and Films
- F. J. García de Abajo
- L. Kuipers
- F. García de Abajo
- T. Ebbesen
- Luis Martin-Moreno
- F. García-Vidal
- Claes-Goran Granqvist
- Philippe Lalanne
Citations in the corpus
- Light passing through subwavelength apertures (2010, background): “Genet and Ebbesen 2007 aimed to present this phenomenon and its main applications to a general audience; the spectroscopic capabilities of holey metal films have also been the subject of several detailed Rev. Mod.”
- Self -induced back-action optical trapping of dielectric nanoparticles (2009, methodology): “In this work, we demonstrate a SIBA optical trap using a nanoaperture in a metal film that is close to its cutoff resonanc”
- Review on Micro- and Nanolithography Techniques and Their Applications (2012, methodology): “The recent discovery of extraordinary transmission through metallic sub-wavelength hole arrays has stimulated extensive interest in SPs among the scientific community [127-132].”
- Ultrafast Laser Applications in Manufacturing Processes: A State-of-the-Art Review (2019, neutral): “…beams in optical near fi elds, such as scanning probe microscopy [96], near-fi eld scanning optical microscopy [97], plasmonic nanolitho-graphy [98 – 100], microlens array nanolithography [101,102], and interference lithography [98,103], nano-features of tens of nanometers were successfully…”