Comparative study on structure and internal stress in tin-doped indium oxide and indium-zinc oxide films deposited by r.f. magnetron sputtering

By T. Sasabayashi, N. Ito, E. Nishimura, M. Kon, P. Song, K. Utsumi, A. Kaijo, Y. Shigesato. 2003

145 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/ec80c54a1d50e435f601bc2faa1b8d094de12bc7