Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)

By A. Anders. 2017

346 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Mechanics of Materials

View Paper: https://www.semanticscholar.org/paper/e7e3a46927bf5acb9efc2986484d77ae4a53e110

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Electrical and Electronic Engineering

1. Zoltán Donkó
2. R. M. Sankaran
3. Peter Bruggeman
4. Mark J. Kushner
5. Igor V. Adamovich
6. Anthony B. Murphy
7. David B. Graves
8. Eduardo Ahedo

In Mechanics of Materials

1. R. M. Sankaran
2. Mark J. Kushner
3. Anthony B. Murphy
4. Zoltán Donkó

Citations in the corpus

• The 2022 Plasma Roadmap: low temperature plasma science and technology (2022, background): “The threshold of translating technologies from the research lab to industry can possibly be lowered for low pressure plasmas by a continued focus on power supply development compatible with existing industrial equipment such as explored for voltage waveform tailoring and high power impulse magnetron”
• Physics of E × B discharges relevant to plasma propulsion and similar technologies (2020, neutral): “…75 there is strong evidence from numerous experiments in high power pulsed magnetron discharges (High Power Impulse Magnetron Sputtering—HiPIMS discharges) and in lower power, DC magnetron discharges 99,100,103 that ionization can play an important role in the formation and dynamics of spokes.”