Impact of Deposition and Annealing Temperature on Material and Electrical Characteristics of ALD HfO2

By D. Triyoso, Ran Liu, D. Roan, M. Ramon, N. Edwards, R. Gregory, D. Werho, J. Kulik, G. Tam, E. Irwin and 7 more. 2004

160 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/e6431d9fa9a3ffe9bcdb92d48b6b5acaf7d30a6a