Oxidation of Polycrystalline Copper Thin Films at Ambient Conditions

By I. Platzman, Reuven Brener, Hossam Haick, R. Tannenbaum. 2008

814 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/e56f0b40abb7eb6dfb63138d4cc269399bcc5299

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In Electrical and Electronic Engineering

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In Electronic, Optical and Magnetic Materials

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In Materials Chemistry

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Citations in the corpus

• Atomistic details of oxide surfaces and surface oxidation: the example of copper and its oxides (2015, methodology): “5 mm and Cu film RT air Electrochemical polishing, annealing in dry H at 600◦ 30 min1300 h XPS, ellipsometry Cu2O on Cu bulk, Cu2O/CuO on Cu film Lim [301] (2008) 100 nm RT air, 10% humidity ion beam deposition, argon ion sputtering 30 min1280 h XPS, SEM, HRTEM Cu deposited with 0 V bias voltage at ”