Total pattern fitting for the combined size-strain-stress-texture determination in thin film diffraction

By Luca Lutterotti. 2010

1,046 citations recorded by the source corpus.

Subfields: Ceramics and Composites, Materials Chemistry, Radiation

View Paper: https://www.semanticscholar.org/paper/e0bdf5e257e83afad655606fa932670c04f38898

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Ceramics and Composites

1. H. Wenk
2. Roman Vasin

In Materials Chemistry

1. Roman Vasin
2. H. Wenk
3. Luca Lutterotti

In Radiation

1. Roman Vasin
2. H. Wenk
3. Luca Lutterotti

Citations in the corpus

• Rietveld texture analysis from synchrotron diffraction images. I. Calibration and basic analysis (2014, methodology): “The procedure implemented in the Rietveld software MAUD (Lutterotti, 2010) relies instead on a first reduction of the diffraction image into several patterns using a graphical centering with no tilting errors.”
• Three-body abrasive wear of fine pearlite, nanostructured bainite and martensite (2013, neutral): “A full pattern Rietveld refinement of bct-martensite and fcc-austenite peaks using MAUD [247] was carried out and the results are listed in Table 8.”
• Increment in evolution of cellulose crystallinity analysis (2020, neutral): “In the MAUD Rietveld program (Lutterotti 2010), background representations that could also be applied to amorphous scattering include polynomials, distribution functions, and point-interpolated splines.”