22nm half-pitch patterning by CVD spacer self alignment double patterning (SADP)
By C. Bencher, Yongmei Chen, H. Dai, W. Montgomery, L. Huli. SPIE Advanced Lithography, 2008
141 citations recorded by the source corpus.
Subfields: Electrical and Electronic Engineering, Surfaces, Coatings and Films
View Paper: https://www.semanticscholar.org/paper/dff4e7cd8afdaa22bdb62fad7e1013052fcf586b
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In Electrical and Electronic Engineering
In Surfaces, Coatings and Films
Citations in the corpus
- Bit-Patterned Magnetic Recording: Theory, Media Fabrication, and Recording Performance (2015, methodology): “SADP is a technique used by the semiconductor industry to double the density of an existing prepattern [86], [87].”