Infrared spectroscopic analysis of the Si/SiO2 interface structure of thermally oxidized silicon

By K. Queeney, M. K. Weldon, Jane P. Chang, Y. Chabal, A. Gurevich, J. Sapjeta, R. Opila. 2000

229 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry, Surfaces, Coatings and Films

View Paper: https://www.semanticscholar.org/paper/de5bb1d314e6cae3f6f0c8ab635ea83a28e2190b